On September 4, 2025, the highly anticipated 13th semiconductor equipment materials and core components exhibition was held in the Taihu Lake International Expo Center. The current Semiconductor Equipment Annual Conference, with the theme of "Strengthening Chinese Chips and Embracing the Chip World", brings together semiconductor equipment manufacturers, sensor manufacturing enterprises, upstream and downstream enterprises in the industry chain, experts and scholars from research institutes to share the latest scientific research achievements and practical application cases, and jointly explore how to empower industrial upgrading through technological innovation.



KANOMAX showcased detection instruments such as dust particle counters, thermal anemometers, wind speed transmitters, and micro differential pressure gauges at booth B3-328.









The crowd surged in front of the booth, with R&D personnel from semiconductor material companies and technical leaders from Fab factories stopping to consult. The staff from Jiaye patiently and meticulously introduced the performance characteristics and application scenarios of the instrument, and conducted product demonstrations on site, allowing everyone to intuitively experience the excellent performance of the product.





Application of Particle Counter in Semiconductor Manufacturing Environment
In the semiconductor chip manufacturing process, there is a high requirement for the cleanliness of the production environment. It is necessary to prohibit crystal short circuits or open circuits caused by dust particles, process deviations, and other factors. The amount of ultrafine particles in the operation site under purified environment must be controlled to ensure product quality and improve product yield.



In the production process of semiconductor chips, particle counters are mainly used for:
1. Manufacturing process testing in Fab factories: Particle counters are used to detect dust particles in the environment during multiple process steps such as photolithography, coating and development, and etching of wafers to ensure the accuracy of the process.
2. Packaging process: During the wafer cutting and packaging process, particle counters also play a crucial role in ensuring packaging quality.
3. Quality monitoring of semiconductor equipment production process: By using particle counters to monitor equipment process points, the stability of the production process and product quality are ensured.



The ultra small dust particle counter 3950 is designed specifically for semiconductor chip manufacturing environments. It can accurately monitor tiny particles of 0.1 μ m and 0.3 μ m, and has the advantage of being lightweight to small. It can also be used as a sensor embedded in production equipment to monitor ultrafine particles in real-time at the work site, providing a reliable basis for the cleanliness assessment of clean working environments. With precise detection technology at the 0.1 μ m level, we have built a strong quality defense line for every micro aspect of "China Chip" manufacturing.




Application of anemometer in semiconductor manufacturing environment
In semiconductor manufacturing, key process steps such as development, etching, and cutting are directly affected by environmental wind speed (local wind speed inside clean rooms and equipment), which directly affects process accuracy, yield, and product reliability. Reasonable wind speed can form a stable "laminar/turbulent flow field", which can carry away particles (such as photoresist residue, etching by-products, cutting dust) and prevent them from adhering to the wafer surface and causing defects;
Meanwhile, abnormal wind speed (too high/too low/uneven) can directly lead to yield loss. For example, a 5% fluctuation in wind speed during the photolithography process may result in a line width deviation of 0.03 μ m (the allowable line width deviation for the 7nm process is only 0.02 μ m), directly leading to chip failure.



The coating and developing equipment requires a high level of cleanliness in the production environment, especially during the process of photoresist coating and development. The contamination of small particles may lead to defects in the photoresist pattern, affecting chip performance. It is necessary to provide clean air through a high-efficiency filter (such as HEPA or ULPA) using a fan filtration unit (FFU) to effectively remove particulate matter from the environment and ensure that the wafer surface is free of contamination, thereby improving the accuracy and yield of photolithography patterns.



The KANOMAX environmental tester 65Ser can accurately capture changes in wind speed inside clean rooms and equipment, whether it is small fluctuations in wind speed or differences in wind speed in local areas. At the same time, it measures wind speed, temperature, humidity, pressure, and the shape and size of the input pipeline section to calculate wind volume. There are 8 probes to choose from, which are widely used in the semiconductor manufacturing equipment industry due to their high precision, probe interchangeability, stability, ease of operation, and multi parameter measurement display.



KANOMAX has been deeply involved in the field of semiconductor clean technology for many years and has won the trust and recognition of numerous customers. The company will continue to increase research and development investment, continuously launch competitive new products and technologies, meet the constantly changing and upgrading needs of the market, and make greater contributions to promoting the development and progress of the semiconductor industry.
Thank you all for visiting and exchanging ideas at the KANOMAX booth in Kano. Let's continue to witness the new journey of semiconductor industry development together tomorrow!