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E-mail
mike.zhang@baselec.com,sunny.liu@baselec.com,sales@baselec.com
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Phone
13812620346,13451671799
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Address
Room 1106, Building 1, Donghuan Building, Suzhou Industrial Park, Jiangsu Province; Room 104, 1st Floor, Building 3, Shangjing Cultural and Creative Guangdong Hong Kong Macao Greater Bay Area Cultural and Technological Industry Park, No. 2 Fumin Middle Road, Dalang Town, Dongguan City; Room 1707, Unit 1, Building 3, No. 347 Shuhan Road, Chengdu City; Room 1106, Building 1, Donghuan Building, Suzhou Industrial Park
Product Categories
Suzhou Beise Electronic Technology Co., Ltd
Focused ion beam electron microscopy
NegotiableUpdate on 02/14
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Overview
■ Technical features: Collecting richer information in a shorter time to accelerate the speed of nano tomography imaging and nano processing: Combining low-voltage SEM performance with FIB beam current up to 100nA
Product Details
■ Technical features:
Collect richer information in a shorter period of time
Accelerate the speed of nano tomography imaging and nano processing: combine low voltage SEM performance with FIB beams up to 100 nA.
Obtaining the richest information: utilizing multi detector acquisition and synchronous etching and imaging capabilities.
Use GEMINI technology and optional ATLAS 3D software package to detect large field of view up to 50 k x 40 k pixels.
Comprehensive process control
Has the highest stability in long-term experiments with strict environmental conditions and can provide a uniform and consistent beam profile.
Real time changes to system parameters such as probe current or acceleration voltage can be made during acquisition without the need to adjust the image.
The graphical user interface is intuitive and easy to operate.
application area
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