IC microscope FJ-5

NegotiableUpdate on 12/25

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Product Details

product details

The FJ-5 research grade metallographic microscope is developed for the needs of the semiconductor industry, silicon wafer manufacturing industry, electronic information industry, and metallurgical industry. As a metallographic microscope user, it can experience its superior performance and can be widely used in semiconductors FPD、 Inspection of circuit packaging, circuit substrates, materials, castings/metal/ceramic components, and precision molds. This instrument adopts two forms of illumination: reflection and transmission. Under the illumination of reflected light, it can perform bright and dark field observation, DIC observation, and polarization observation. Observe the bright field under transmitted light. A stable and high-quality optical system provides clearer imaging and better contrast. A design that meets ergonomic requirements, making you feel comfortable and relaxed at work.
Characteristic Description
1. The objective imaging technology adopts the UIS high-resolution and long working distance optical path correction system.

2. Expanded the reuse technology of the objective lens, and the far objective lens is compatible with all observation methods including bright and dark field of view, polarization, DIC, and provides high-definition image quality in each observation method.

3. Use non spherical Kohler illumination to increase observation brightness.

4. WF10 × (Φ 25) ultra large field eyepiece, long working distance bright and dark field metallographic objective.

5. A converter that can be plugged into a DIC differential interference device.

technical specifications
viewing head	30 ° hinge type three mesh (50mm-75mm)
eyepiece	WF10×/25mm
eyepiece	WF10 ×/20mm, with 0.1mm cross dividing plate
objective	Long distance work on a flat field Distance from light and dark field objective lenses: 5 ×/0.1B.D/W.D.29.4mm, 10 ×/0.25B.D/W.D. 16mm, 20 ×/0.40B.D/W.D. 10.6mm, 40 ×/0.60B.D/W.D. 5.4mm
converter	Four hole converter with DIC jack
platform	Double layered mobile platform
	Platform size: 189mm × 160mm
	Mobile range: 80mm × 50mm
Filter	Plug in color filter (green, blue, neutral)
condenser	N. A.1.25 Abbe condenser with variable aperture and color filter
focus adjustment	Coarse and micro coaxial focusing, using a gear rack transmission mechanism Micro grid value 0.002mm
light source	Transmitting lighting: halogen lamp 12V/50W, AC85V-230V, adjustable brightness
light source	Falling light illumination: with aperture light bar and field of view light bar, halogen lamp 12V/50W, AC85V-230V, adjustable brightness
Polarizing device	The analyzer can rotate 360 degrees, and both the polarizer and analyzer can be moved out of the optical path
Testing tools	0.01mm measuring ruler
Available as attachments	Two dimensional measurement software
	Professional metallographic image analysis software
	Falling light illumination: halogen lamp 12V/100W, AC85V-230V, adjustable brightness
	Flat field long working distance bright and dark field objective lenses: 50 ×/0.55B. D/W.D. 5.1mm, 80 ×/0.75B. D/W.D. 4mm, 100 ×/0.80B. D/W.D. 3mm
	micrometer eyepiece
	1.3 million, 2 million, 3 million, and 5 million pixel CMOS electronic eyepieces
	Photography device and CCD interface 0.5 ×, 0.57 ×, 0.75 ×
	DIC (10 x, 20 x, 40 x, 100 x)
	press
	Color 1/3-inch CCD 520 lines