Kejing Ultrasonic Rotary Spraying Instrument

KejingUltrasonic rotary sprayer

Model:VTC-300USS

Product Overview:

VTC-300USS is an affordable ultrasonic rotary sprayer that combines a 12 inch vacuum rotary coating machine with an ultrasonic nozzle. The nozzle can be connected to an air compressor and used for air pressure spraying, combined with ultrasonic atomization, to make the film on the substrate more uniform.

Structure of rotary coating machine:

• Adopting cast aluminum structure for more stable rotation
• Vacuum suction cups can support substrateszuiThe large diameter is 12 inches
• zuiHigh RPM: 3000RPM (for 12 inch substrates) 5000RPM (for 8-inch substrates)
• There is a protective cover at the top of the sample stage to prevent the sample from flying out
• A swinging robotic arm (adjustable swing speed) is installed on the rotary coating machine, and an ultrasonic nozzle is mounted on this swinging arm
• The instrument is equipped with an AP-1400V bipolar rotary vane oil-free vacuum pump

KejingUltrasonic rotary sprayer

Model:VTC-300USS

Ultrasonic spray：

• One ultrasonic atomizer, two ultrasonic nozzles (can be assisted by compressed air)
• Two channel injection pump with independent control (injected liquid)zuiIt can be heated to 60 ℃), this injection pump will be connected to the ultrasonic spray head to inject liquid into the ultrasonic spray head
• Optional: Halogen lamps with thermocouples and temperature controllers can be selected to heat the coated substrate,zuiHigh temperature can be heated up to 90 ℃;zuiHigh power 1000W

Instrument operation requirements：

• Power supply: AC208-240V, 3000W
• Gas: 1MPa compressed air or inert gas

Net weight：72kg

Quality certification:CE Certification

Application notes:

• The rotary sprayer must be used in a fume hood to prevent the liquid from evaporating into the laboratory. (You can purchase a fume hood from our company)
• in order to obtainzuiFor optimal coating effect, it is recommended to perform plasma cleaning on the substrate before coating. After plasma cleaning, not only can the surface of the substrate be cleaned, but the surface tension of the substrate can also be greatly reduced