The P series MFC mass flow controller MFC can be applied in semiconductor front-end processes such as ETCH, PVD, ALD, MOCVD, IMP and other equipment, as well as in the fields of photovoltaic energy and vacuum coating, which have considerable markets. $r $nMFC can effectively provide higher yield by precise control of gas flow rate.
Mass flow controllerMFC P series
P series MFCMass flow controllerIt is a device with high performance and reliability in the field of gas flow control. Here is an introduction to some of its features and applications:Adopting an improved single valve+differential pressure+position sensing design for measurement accuracy ± �% S.P.(��% - ���% F.S.)Response speed ≤ ms(��% - ���% F.S.)。
high-precision controlBy adopting advanced sensing technology and control algorithms, high-precision gas mass flow control can be achieved, and measurement errors can be controlled at a low level to meet various process requirements with high flow accuracy requirements2.
quick responseHaving a short response time, it can quickly respond to changes in the flow setting value, adjust the gas flow rate quickly, and ensure the stability and consistency of the process2.
Wide rangeWide range coverage, suitable for different application scenarios from small flow rates to large flow rates, and able to meet the different requirements of gas flow rates for various processes2.
Multi gas compatibilityBuilt in multiple gas databases, supporting various types of gases without the need for complex manual settings and conversions, making it easy to switch between different gases for flow control2.
Good environmental adaptabilityUsing high-quality materials and design, it has good corrosion resistance and anti-interference ability, and can work stably under different environmental conditions, adapting to various industrial environments2.
Convenient operation and communicationEquipped with an intuitive operating interface, it is convenient for users to set parameters and monitor, and supports multiple communication protocols. It can be easily integrated with the upper computer or other control systems to achieve remote operation and automation control.
Semiconductor manufacturingIn semiconductor processes such as etching, chemical vapor deposition (CVD), physical vapor deposition (PVD), etc., precise control of the flow rate of various process gases is crucial for ensuring the quality and consistency of chip manufacturing. For example, in the etching process, the flow rate of etching gases such as carbon tetrafluoride and sulfur hexafluoride is precisely controlled to ensure that the etching reaction proceeds at a predetermined rate and direction; In the CVD process, the flow rate of reaction gases such as silane and ammonia is precisely controlled to ensure that the chemical composition, thickness, and quality of the deposited film meet the standards.
BiomedicineIn fields such as drug development and biological fermentation, it is used to precisely control the flow rate of various gases, such as controlling the supply ratio of oxygen, carbon dioxide, and other gases during cell culture to create a suitable environment for cell growth; In drug production, precise addition of trace reagent gases also requires high-precision MFC to achieve.
chemical productionIn chemical synthesis, fine chemical processes, etc., it is used to control the flow rate of various reaction gases and raw material gases, ensuring the smooth progress of chemical reactions and stable product quality. For example, in some organic synthesis reactions, the flow rate of gases such as hydrogen and nitrogen is precisely controlled to regulate the reaction rate and selectivity.
new energyIn the field of new energy, such as the production and testing process of fuel cells, it is necessary to accurately control the flow of gases such as hydrogen and oxygen to ensure the performance and stability of fuel cells; MFC is also used in the manufacturing process of solar cells to control the flow rate of related process gases
