-
E-mail
bimuyiqi@163.com
- Phone
-
Address
Building 28, 6999 Chuansha Road, Pudong New Area, Shanghai
Shanghai Bimu Instrument Co., Ltd
bimuyiqi@163.com
Building 28, 6999 Chuansha Road, Pudong New Area, Shanghai
1、 Instrument usage
The differential interference inverted metallographic microscope adopts a high-quality infinite distance optical system, and is equipped with a long working distance flat field flat field achromatic objective lens that is compatible with both bright and dark fields. The system is designed with multiple optical paths and can support both binocular tube observation and digital camera observation simultaneously. Differential interference inverted metallographic microscope can be widely used to study the microstructure of metals. It can observe and photograph under bright field, dark field, polarization, and differential interference, and is equipped with specialized software for synchronous measurement and analysis. It can be used for research institutions, metallurgy, mechanical manufacturing factories, and higher industrial colleges to conduct metallographic experiments and research on metallurgy and heat treatment, metal physics, steelmaking and casting processes.
2、 Product Features
Adopting an excellent infinite optical system can provide outstanding optical performance. The compact and stable high rigidity body fully embodies the anti vibration requirements of microscopic operations. Large stroke mechanical mobile loading platform, suitable for microscopic observation of large samples or rapid detection of multiple samples. Modular functional design makes it easy to upgrade the system and achieve functions such as polarization observation and differential interference phase contrast observation. Ideal design that meets ergonomic requirements, making operation more convenient, comfortable, and spacious.
3、 Technical parameters
1. Eyepiece
| category | magnification | Field of view diameter (mm) |
| Large field flat field eyepiece | 10× | Φ22 |
| Cross micrometer eyepiece | 10× | Φ20 |
2. Objective lens
| optical system | magnification | Numerical Aperture | working distance |
| Infinite long bright dark flat field achromatic objective lens | 5× | 0.12 | 10 |
| 10× | 0.25 | 10 | |
| 20× | 0.4 | 5 | |
| 50× | 0.75 | 1.3 | |
| 100× | 0.9 | 0.7 |
3. Optical magnification: 50X 100X 200X 500X 1000X
4. Articulated three lens barrel, tilted at 45 °; Spectral ratio: Observation 80% Photography 20% or Observation 100% or Photography 100%
5. Five hole converter small platform: one droplet type, one small hole, and one large hole each
6. Focusing mechanism: Coarse micro coaxial focusing fine adjustment grid value: 0.002mm stroke (from the focal point of the stage surface): 1mm upwards, 7mm downwards
7. Stage: 226mm × 178mm, with a range of movement of 40mm × 40mm. Two tablets are pressed on the platform
8. Lighting system: 12V 50 halogen lamp, center and brightness continuously adjustable
4、 System composition
Computer type (BMM-303E): 1, metallographic microscope 2, adapter lens 3, camera (CCD) 4, A/D (image acquisition) 5, driver software 6, data cable 7, computer (optional)
Digital type (BMM-303D): 1. Metallographic microscope 2. Adaptor lens 3. Digital camera
5、 Total magnification reference factor
BMM-303E computer model: 50-4500 times BMM-303D digital camera model: 50-2000 times
6、 Optional parts
1. Large field eyepiece: 15X 20X 2. Objective lens: 50X 60X 100X (dry) 3. High pixel imaging system 4. Metallographic image measurement software 5. Metallographic structure analysis software (quantitative)