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Shenzhen Fangrui Technology Co., Ltd
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Shenzhen Fangrui Technology Co., Ltd

  • E-mail

    sales1@szfangru.com

  • Phone

    15219492755

  • Address

    4th Floor, Building 2, Xinghuang Technology Park, Seventh Industrial Zone, Heshuikou Community, Gongming Town, Guangming District, Shenzhen City

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USC Dry Dust Removal and Cleaning Machine

NegotiableUpdate on 10/25
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Overview

USC is widely used in the display screen industry, camera module industry, LED industry, semiconductor industry, lithium battery industry, PCB/FPC and other industries. It quickly and effectively removes floating and sinking particles on the surface of products, ensuring the quality of subsequent spraying, coating, bonding, welding, packaging and other processes, greatly reducing failure rates, and improving product yield

Product Details

The USC dry ultrasonic dust removal and cleaning machine is divided into 2UV and U2V types - P or C series


Product specifications: 2UV/U2V-P/C series Technical parameters
model Effective width L1 (mm) Inlet P Inhalation V interface L2(mm) W(mm) H(mm)
Pressure (KPa) Flow rate (m3/h) Pressure (KPa) Flow rate (m3/h) Installation style
2UV/U2V 100 18 210 -3 230 A/B 300 110 126
200 18 260 -3 280 A/B 400
300 18 320 -3 350 A/B 500
450 18 380 -3 420 A/B 650
600 18 450 -3 480 C 800 120 161
800 18 520 -3 560 C 1000
1000 18 780 -3 820 C/D 1200
1200 18 1050 -3 1100 C/D 1400 170 230
1500 18 1380 -3 1430 C/D 1700
1800 18 1600 -3 1650 C/D 2000
2000 18 1830 -3 1880 C/D 2200
Working Voltage 380V AC
atmospheric pressure 10-28KPa
Distance from dust removal unit to workpiece Within 5mm, it is recommended to maintain a distance of 1.5mm
removal rate 1.6um silicon dust 97%, 2.6um silicon dust 98%
function Wind pressure monitoring, temperature monitoring, filter element monitoring, fan monitoring
The length from the dust removal unit to the main pipe Within 15 meters
outlet air temperature Less than 50 degrees
Work voice Less than 85 decibels
Usage environment Cleanroom below 10000 level; Reserved exhaust pipe: diameter 65mm