KRI Hall Ion Source Gridless eH Series from the United States

The KRI Hall ion source eH series, established by Dr. Kaufman and represented by Shanghai Bodong, is a wide beam ion source with a scattering angle of 45 degrees. The gas flow rate of the Hall ion source can be selected from different levels such as 2-25 sccm/2-50 sccm/2-50 sccm/2-75 sccm/5-100 sccm The Hall ion source current can be selected from 5A/10A/12A/15A/20A, etc The high concentration of Hall ion source increases the deposition rate of coating, while the low kinetic energy reduces ion bombardment damage to the surface. The wide beam design effectively improves throughput and covers the deposition area Overall easy to operate and maintain Hall ion source eH provides a complete solution including ion source, electron neutralizer, power supply, flow controller MFC, and more