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Bodong Enterprise (Shanghai) Co., Ltd
KRI Hall Ion Source eH 400 from the United States
NegotiableUpdate on 07/20
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Overview
The KRI Hall ion source eH 400, established by Dr. Kaufman and represented by Shanghai Bodong, offers a low-cost design that provides high ion current. The size and ion energy of the Hall ion source eH 400 are particularly suitable for small and medium-sized vacuum systems, and can control lower ion energy. It is commonly used in ion assisted coating, pre cleaning, and low-energy ion etching Size: Diameter=3.7 Height=3 Discharge voltage/current: 50-300eV/5a Operating gases: Ar, Xe, Kr, O2, N2, organic precursors
Product Details
Product Features of KRI Hall Ion Source eH 400 in the United States:
BodongKRIHall ion sourceeH 400characteristic:
1.Detachable anode component-Easy to maintain;During maintenance,Minimize downtime to the greatest extent possible;Plug and play spare anode
2.Wide beam high discharge current-Uniform etching rate;High etching efficiency;High ion assisted coatingIADefficiency
3.multipurpose-apply toLoad lock /Ultra high vacuum system
4.Efficient plasma conversion and stable power control
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