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Bodong Enterprise (Shanghai) Co., Ltd
KRI Hall ion source eH 1000 from the United States
NegotiableUpdate on 07/20
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Overview
The KRI Hall ion source eH 1000, established by Dr. Kaufman from the United States and represented by Shanghai Bodong, is an efficient gas utilization and low-cost design that provides high ion current, making it particularly suitable for medium-sized vacuum systems Belongs to a grid free ion source Usually used for ion assisted coating, pre cleaning, and low-energy ion etching Size: Diameter=5.7 Height=5.5 Discharge voltage/current: 50-300V/10A Operating gases: Ar, Xe, Kr, O2, N2, organic precursors
Product Details
Product Features of KRI Hall Ion Source eH 1000 in the United States:
BodongKRIHall ion sourceeH 1000characteristic:
1.Detachable anode component-Easy to maintain;During maintenance,Minimize downtime to the greatest extent possible;Plug and play spare anode
2.Wide beam high discharge current-High;Uniform etching rate;High etching efficiency;High ion assisted coatingIADefficiency
3.multipurpose-apply toLoad lock /Ultra high vacuum system;Easy installation;No need for water cooling
4.Efficient plasma conversion and stable power control
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