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Shenzhen Kerui Shiting Technology Co., Ltd

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13926558058@163.com
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13926558058
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6I, Building B (Office), Central Avenue, Intersection of Xixiang Avenue and Baoyuan Road, Labor Community, Xixiang Street, Bao'an District, Shenzhen City

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Mass flow controller

NegotiableUpdate on 12/10

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Nature of the Manufacturer: Producers

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Overview

The V series MFC is a device used for precise control of gas mass flow rate. MFC can be applied in semiconductor front-end processes such as ETCH, PVD, ALD, MOCVD, IMP and other equipment, as well as in photovoltaic energy, vacuum coating and other fields with considerable market potential. $r $nMFC can effectively provide higher yield by precise control of gas flow rate.

Product Details

Mass flow controllerV series MFC

Mass flow controllerThe VG80 series MFC is a component used to control gas mass flow and has the following characteristics1：

Design DutyAdopting a dual valve+pressure drop+position sensing dute design.
Performance YouyueFast response speed, start stop time ≤ 100ms; high measurement accuracy, up to ± 0.5% S.P; The measurement range is wide, ranging from 2-100% F.S; Strong self diagnostic ability and low maintenance cost.

Application Scenario:MFC can be applied in semiconductor front-end processes such as ETCH, PVD, ALD, MOCVD, IMP and other equipment, as well as in the fields of photovoltaic energy and vacuum coating, which have considerable markets.MFC can effectively provide higher yield by precise control of gas flow rate.

This series of products can be widely used in semiconductor manufacturing processes such as etching, chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), and metal organic chemical vapor deposition (MOCVD). They are also suitable for fields such as microwave plasma chemical vapor deposition (MPCVD), antipyretic thawing and drying, quartz purification, and medical waste treatment.

质量流量控制器