ME-L type broad spectrum Mueller matrix ellipsometer

overview

ME-L is a research grade fully automatic high-precision Mueller matrix ellipsometer, which embodies the years of investment of the Yiguang research team in ellipsometry technology. It adopts the latest and cutting-edge innovative technologies in the industry, including achromatic compensator, dual rotation compensator synchronous control, Mueller matrix data analysis, etc. It can be applied to characterize and analyze the film thickness, optical nano grating constants, and one-dimensional/two-dimensional nano grating material structures of various isotropic/anisotropic thin film materials.

The dual rotation compensator (DRC) is configured to measure all 16 elements of the Mueller matrix in one measurement; Configure high-quality hardware modules such as automatic angle converters and five dimensional sample control platforms; The software interactive interface is designed with an auxiliary wizard style, making it easy to learn and operate; Rich databases and geometric structure model libraries ensure powerful data analysis capabilities.

CHARACTERISTICS
1. Using a composite light source of deuterium lamp and halogen lamp, the spectrum covers the ultraviolet to near-infrared range (193-2500nm);



2. It can achieve Mueller matrix data processing, with a larger amount of measurement information, faster measurement speed, and more accurate data;



3. Based on a dual rotation compensator configuration, all 16 elements of the Mueller matrix can be measured in one go, providing richer and more comprehensive measurement information compared to traditional spectroscopic ellipsometers;



4. Yiguang's patented technology ensures the provision of high-quality and stable spectra across a wide spectral range;





5. Hundreds of material databases and multiple algorithm model libraries cover the vast majority of optoelectronic materials currently available;



6. Integrating the analysis of nano gratings, it can simultaneously measure and analyze geometric morphology information such as nanostructure period, line width, line height, sidewall angle, roughness, etc;




2、 Product application
Semiconductor thin film structure: dielectric thin film, metal thin film, polymer, photoresist, silicon, PZT film, laser diode GaN and AlGaN, transparent electronic devices, etc;
Semiconductor periodic nanostructures: nano gratings, etching errors, T-shaped phase change memory, etc;
Research on new materials and new physical phenomena: material optical anisotropy, electro-optic effect, elasto optical effect, acousto-optic effect, magneto-optical effect, optical rotation effect, Kerr effect, Farady effect, etc;
Flat panel displays: TFT, OLED, plasma display panel, flexible display panel, etc;
Photovoltaic solar energy: measurement of reflectivity and extinction coefficient of photovoltaic materials (such as Si3N4, Sb2Se3, Sb2S3, CdS, etc.), measurement of film thickness and surface roughness, etc;
Functional coatings: anti reflective, self-cleaning, electrochromic, mirror optical coatings, as well as polymer, oil, Al2O3 surface coatings and treatments;
Biological and chemical engineering: organic thin films, LB films, SAM films, protein sub molecular layers, thin film adsorption, surface modification treatments, etc;
Block material analysis: characterization of refractive index n and extinction coefficient k of solids (metals, semiconductors, dielectrics, etc.) or liquids (pure substances or mixtures), research and quality control of new glass products, etc.
Suggested accessories

Temperature control table	Mapping extension module	vacuum pump	Transmission adsorption component