Wuhan Yiguang ME-L Mueller Matrix Ellipsometer

NegotiableUpdate on 03/16

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

ME-L Mueller Matrix Ellipsometer I. Product Introduction: 1. Ultra wide spectral range: using a composite light source of deuterium and halogen lamps

Product Details

ME-L Mueller Matrix Ellipsometer

1、 Product Introduction:

1. Ultra wide spectral range: using a composite light source of deuterium and halogen lamps, the spectrum covers the ultraviolet to near-infrared range (380-1000nm) and supports expansion to 200-1650nm

2. Dual rotation compensator modulation: high-precision rotation and trigger synchronous control to achieve high-speed spectral data acquisition

3. Full Mueller Matrix Measurement: Based on a dual rotation compensator configuration, 16 elements of the Mueller matrix can be obtained at once, providing richer and more comprehensive measurement information compared to traditional spectroscopic ellipsometers

4. Super chromatic aberration compensation design: patented compensator technology, suitable for high-precision phase modulation requirements in a wide spectral range from deep ultraviolet to near-infrared

5. Rich material databases and algorithm models: hundreds of material databases, multiple algorithm model libraries, covering the vast majority of optical materials currently available

6. Guided interactive interface: software guided interactive human-machine interface operation, providing users with high-quality operation experience

7. Nano grating analysis capability: Advanced analysis algorithm models are used to extract geometric morphology information such as period, line width, line height, sidewall angle, and roughness of various nano grating structures

2、 Technical parameters:

basic function	Obtain Mueller matrix, Psi/Delta, N/C/S, R/T and other spectra at once
spectral range	380-1000nm (210-1650nm optional)
Time	1-8s
Range of incidence angle	45-90°
Spot size	2-3mm/200um
Repetitive accuracy	0.005nm (100nm SiO2 silicon wafer)
Absolute accuracy (Air medium)	Elliptical polarization parameter: ψ=45 ± 0.05 ° Δ=0 ± 0.01 °
Absolute accuracy (Air medium)	Mueller matrix: diagonal element m=1 ± 0.005, non diagonal element m=0 ± 0.005
Analysis software	Up to hundreds of optical material libraries, supporting user customization
Analysis software	Multi layer isotropic/anisotropic optical thin film, periodic grating structure modeling, simulation and analysis functions